Quantitative depth profiling of boron and arsenic ultra low energy implants by pulsed rf-GD-ToFMS

Author:

Lobo Lara,Fernández Beatriz,Pereiro Rosario,Bordel Nerea,Demenev Evgeny,Giubertoni Damiano,Bersani Massimo,Hönicke Philipp,Beckhoff Burkhard,Sanz-Medel Alfredo

Publisher

Royal Society of Chemistry (RSC)

Subject

Spectroscopy,Analytical Chemistry

Reference30 articles.

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2. Estimation of ultra-shallow implants using SIMS, NRA and chemical analysis

3. Tissue Molecular Ion Imaging by Gold Cluster Ion Bombardment

4. M. G. Dowsett , J.Bellingham, S.Al-Harti, B.Guzman, T. J.Ormsby, G. A.Cooke, C.McConville, Proceedings of the Second International Symposium on SIMS and Related Techniques, Seikei University, Japan, 2000

5. An (un)solvable problem in SIMS: B-interfacial profiling

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