Synthesis and characterization of fluorinated poly(aryl ether)s with excellent dielectric properties
Author:
Affiliation:
1. School of Materials Science & Chemical Engineering, Ningbo University, Ningbo 315211, People's Republic of China
2. Ningbo Institute of Materials Technology & Engineering, Chinese Academy of Science, Ningbo 315201, People's Republic of China
Abstract
Funder
National Basic Research Program of China
China Postdoctoral Science Foundation
Publisher
Royal Society of Chemistry (RSC)
Link
http://pubs.rsc.org/en/content/articlepdf/2024/PY/D4PY00119B
Reference37 articles.
1. Facile Strategy for Intrinsic Low-k Dielectric Polymers: Molecular Design Based on Secondary Relaxation Behavior
2. Graphene and two-dimensional materials for silicon technology
3. Low dielectric constant polymers for microelectronics
4. Polyimide-based gate dielectrics for high-performance organic thin film transistors
5. Influence of crosslink density on thermal, mechanical and dielectric properties of cross-linked fluorinated poly(aryl ether)s
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