Chemical reaction mechanism of ZnO grown using DEZn and N2O in MOCVD-Reference-Cited by-同舟云学术

Chemical reaction mechanism of ZnO grown using DEZn and N2O in MOCVD

Author:

Li Jian¹²³⁴,Gan Hanlin⁵⁶⁷⁸⁴^ORCID,Xu Yifeng¹²³⁴,Wang Chaoyang⁵⁶⁷⁸⁴,Pei Yanli¹²³⁴⁹,Gu Feng Long⁵⁶⁷⁸⁴^ORCID,Wang Gang¹²³⁴⁹^ORCID

Affiliation:

1. School of Electronics and Information Engineering

2. Sun Yat-sen University

3. Guangzhou 51000

4. China

5. Key Laboratory of Theoretical Chemistry of Environment, Ministry of Education

6. School of Chemistry and Environment

7. South China Normal University

8. Guangzhou 510006

9. State Key Laboratory of Optoelectronic Materials and Technologies

Abstract

ZnO thin films were prepared by metal–organic chemical vapor deposition (MOCVD) using diethylzinc (DEZn) and N₂O.

Funder

National Natural Science Foundation of China

Publisher

Royal Society of Chemistry (RSC)

Subject

Condensed Matter Physics,General Materials Science,General Chemistry

Link

Reference54 articles.

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