Synthesis, structure, vapour pressure and deposition of ZnO thin film by plasma assisted MOCVD technique using a novel precursor bis[(pentylnitrilomethylidine) (pentylnitrilomethylidine-μ-phenalato)]dizinc(II)-Reference-Cited by-同舟云学术

Synthesis, structure, vapour pressure and deposition of ZnO thin film by plasma assisted MOCVD technique using a novel precursor bis[(pentylnitrilomethylidine) (pentylnitrilomethylidine-μ-phenalato)]dizinc(II)

Published:2017-02 Issue: Volume:1130 Page:1-9
ISSN:0022-2860
Container-title:Journal of Molecular Structure
language:en
Short-container-title:Journal of Molecular Structure

Author:

Chandrakala C.,Sravanthi P.,Raj Bharath S.,Arockiasamy S.^ORCID,George Johnson M.,Nagaraja K.S.,Jeyaraj B.

Publisher

Elsevier BV

Subject

Inorganic Chemistry,Organic Chemistry,Spectroscopy,Analytical Chemistry

Reference67 articles.

1. ZnO/quartz structure potentiality for surface acoustic wave pressure sensor

2. Deposition of high-quality zinc oxide thin films on diamond substrates for high-frequency surface acoustic wave filter applications

3. Relationships between material properties of piezo-electric thin films and device characteristics of film bulk acoustic resonators

4. Low-temperature deposition of ZnO thin films on PET and glass substrates by DC-sputtering technique

5. High transmittance and low resistive ZnO:Al films for thin film solar cells

Cited by 6 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Characterization of Ag-doped ZnO thin films by spray pyrolysis and its using in enhanced photoelectrochemical performances;Inorganic Chemistry Communications;2020-09

2. ZnO and Related Materials;Metalorganic Vapor Phase Epitaxy (MOVPE);2019-08-30

3. Stability Analysis of Multi Process Parameters for Metal-Organic Chemical Vapor Deposition Reaction Cavity;Molecules;2019-03-01

4. Chemical reaction-transport model of diethylzinc hydrolysis in a vertical MOCVD reactor;Applied Thermal Engineering;2018-05

5. Chemical reaction mechanism of ZnO grown using DEZn and N2O in MOCVD;CrystEngComm;2018