Synergistic additive-mediated CVD growth and chemical modification of 2D materials-Reference-Cited by-同舟云学术

Synergistic additive-mediated CVD growth and chemical modification of 2D materials

Published:2019 Issue:17 Volume:48 Page:4639-4654
ISSN:0306-0012
Container-title:Chemical Society Reviews
language:en
Short-container-title:Chem. Soc. Rev.

Author:

Jiang Jizhou¹²³⁴⁵^ORCID,Li Neng⁶⁷⁴⁵^ORCID,Zou Jing¹²³⁴⁵,Zhou Xing⁸⁹¹⁰⁴⁵^ORCID,Eda Goki¹¹¹²¹³¹⁴^ORCID,Zhang Qingfu⁸⁹¹⁰⁴⁵,Zhang Hua¹⁵⁹¹⁶¹⁷¹⁴^ORCID,Li Lain-Jong⁹¹⁸¹⁹^ORCID,Zhai Tianyou⁸⁹¹⁰⁴⁵^ORCID,Wee Andrew T. S.¹¹¹²¹³¹⁴^ORCID

Affiliation:

1. School of Environmental Ecology and Biological Engineering

2. School of Chemistry and Environmental Engineering

3. Wuhan Institute of Technology

4. Wuhan

5. P. R. China

6. State Key Laboratory of Silicate Materials for Architectures

7. Wuhan University of Technology

8. State Key Laboratory of Material Processing and Die & Mould Technology

9. School of Materials Science and Engineering

10. Huazhong University of Science and Technology

11. Department of Physics

12. National University of Singapore

13. Singapore 117542

14. Singapore

15. Center for Programmable Materials

16. Nanyang Technological University

17. Singapore 639798

18. University of New South Wales

19. Australia

Abstract

This review summarizes significant advances in the use of typical synergistic additives in growth of 2D materials with chemical vapor deposition, and the corresponding performance improvement of field effect transistors and photodetectors.

Funder

National Natural Science Foundation of China

Ministry of Education - Singapore

Agency for Science, Technology and Research

Nanyang Technological University

City University of Hong Kong

Publisher

Royal Society of Chemistry (RSC)

Subject

General Chemistry

Link

http://pubs.rsc.org/en/content/articlepdf/2019/CS/C9CS00348G