In situ analysis of growth rate evolution during molecular layer deposition of ultra-thin polyurea films using aliphatic and aromatic precursors
Author:
Affiliation:
1. Department of Chemical and Biomolecular Engineering, North Carolina State University, 911 Partners Way, Raleigh, North Carolina 27606, USA
2. Micron Technology Inc., 8000 S Federal Way, Boise, Idaho 83716, USA
Abstract
Funder
U.S. Department of Defense
National Science Foundation
Publisher
Royal Society of Chemistry (RSC)
Subject
Inorganic Chemistry
Link
http://pubs.rsc.org/en/content/articlepdf/2022/DT/D1DT03689K
Reference64 articles.
1. Pentacene thin-film on organic/inorganic nanohybrid dielectrics for ZnO charge injection memory transistor
2. Fine-Tunable Absorption of Uniformly Aligned Polyurea Thin Films for Optical Filters Using Sequentially Self-Limited Molecular Layer Deposition
3. Safe and Durable High-Temperature Lithium–Sulfur Batteries via Molecular Layer Deposited Coating
4. Atomic and Molecular Layer Deposition of Hybrid Mo–Thiolate Thin Films with Enhanced Catalytic Activity
5. Platinum-Free Cathode for Dye-Sensitized Solar Cells Using Poly(3,4-ethylenedioxythiophene) (PEDOT) Formed via Oxidative Molecular Layer Deposition
Cited by 6 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Building Semipermeable Films One Monomer at a Time: Structural Advantages via Molecular Layer Deposition vs Interfacial Polymerization;Chemistry of Materials;2024-01-18
2. Quantified Uniformity and Selectivity of TiO2 Films in 45‐nm Half Pitch Patterns Using Area‐Selective Deposition Supercycles;Advanced Materials Interfaces;2023-06-17
3. Compatibility between polymethacrylate-based extreme ultraviolet resists and TiO2 area-selective deposition;Journal of Micro/Nanopatterning, Materials, and Metrology;2022-11-04
4. Mechanisms for undesired nucleation on H-terminated Si and dimethylamino-trimethylsilane passivated SiO2 during TiO2 area-selective atomic layer deposition;Applied Physics Letters;2022-08-22
5. Improving polymethacrylate EUV resists with TiO2 area-selective deposition;Advances in Patterning Materials and Processes XXXIX;2022-05-25
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线,采集、加工和组织学术论文而形成的新型学术文献查询和分析系统,可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容,当前同舟云学术共收录了国内外主流学术期刊6万余种,收集的期刊论文及会议论文总量共计约1.5亿篇,并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询!咨询电话:010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3