Improved switching characteristics of p-type tin monoxide field-effect transistors through Schottky energy barrier engineering
Author:
Affiliation:
1. Department of Electronic Engineering
2. Hanyang University
3. Seoul 04763
4. Korea
5. School of Electrical Engineering, Korea University
6. Seoul 02841
Abstract
Metal–interlayer–semiconductor contact reduces metal-induced gap states, mitigating Fermi-level pinning at metal/semiconductor interface. Here, switching property of p-type SnO FET is enhanced by increasing electron Schottky barrier at off-state.
Funder
Samsung
Publisher
Royal Society of Chemistry (RSC)
Subject
Materials Chemistry,General Chemistry
Link
http://pubs.rsc.org/en/content/articlepdf/2020/TC/C9TC04345D
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