Improved switching characteristics of p-type tin monoxide field-effect transistors through Schottky energy barrier engineering

Author:

Kim Taikyu1234ORCID,Kim Jeong-Kyu564ORCID,Yoo Baekeun1234ORCID,Xu Hongwei1234ORCID,Yim Sungyeon1234ORCID,Kim Seung-Hwan564ORCID,Yu Hyun-Yong564ORCID,Jeong Jae Kyeong1234ORCID

Affiliation:

1. Department of Electronic Engineering

2. Hanyang University

3. Seoul 04763

4. Korea

5. School of Electrical Engineering, Korea University

6. Seoul 02841

Abstract

Metal–interlayer–semiconductor contact reduces metal-induced gap states, mitigating Fermi-level pinning at metal/semiconductor interface. Here, switching property of p-type SnO FET is enhanced by increasing electron Schottky barrier at off-state.

Funder

Samsung

Publisher

Royal Society of Chemistry (RSC)

Subject

Materials Chemistry,General Chemistry

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