Chemical vapour deposition of polycarbosilanes via ArF laser-induced photolysis of sila-, 1-methyl-1-sila- and 1,3-disila-cyclobutanes-Reference-Cited by-同舟云学术

Chemical vapour deposition of polycarbosilanes via ArF laser-induced photolysis of sila-, 1-methyl-1-sila- and 1,3-disila-cyclobutanes

Published:1995 Issue:9 Volume:5 Page:1345-1349
ISSN:0959-9428
Container-title:J. Mater. Chem.
language:en
Short-container-title:J. Mater. Chem.

Author:

Pola Josef,Bastl Zdeněk,Šubrt Jan,Taylor Roger

Publisher

Royal Society of Chemistry (RSC)

Subject

Materials Chemistry,General Chemistry

Link

http://pubs.rsc.org/en/content/articlepdf/1995/JM/JM9950501345

Reference49 articles.

1. Improvement of the optical and photoelectric properties of hydrogenated amorphous silicon‐carbon alloys by using trisilylmethane as a feedstock

2. H. Schmidbaur , R.Hager and J.Zech, in Frontiers of Organosilicon Chemistry, ed. A. R. Bassindale and P. P. Gaspar, The Royal Society of Chemistry, Cambridge, 1991, p. 62.

3. Mass spectrometric investigation of the thermal decomposition of various organosilicon compounds in SixC1-x(H) chemical vapour deposition

4. Mechanism of pyrolysis of polycarbosilanes: poly(silylethylene) and poly(dimethylsilylethylene)

5. Pyrolysis chemistry of an organometallic precursor to silicon carbide

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