Competition of Silene/Silylene Chemistry with Free Radical Chain Reactions Using 1-Methylsilacyclobutane in the Hot-Wire Chemical Vapor Deposition Process-Reference-Cited by-同舟云学术

Competition of Silene/Silylene Chemistry with Free Radical Chain Reactions Using 1-Methylsilacyclobutane in the Hot-Wire Chemical Vapor Deposition Process

Published:2012-09-12 Issue:41 Volume:116 Page:10054-10062
ISSN:1089-5639
Container-title:The Journal of Physical Chemistry A
language:en
Short-container-title:J. Phys. Chem. A

Author:

Badran I.¹,Forster T. D.¹,Roesler R.¹,Shi Y. J.¹

Affiliation:

1. Department of Chemistry, University of Calgary, Calgary, Alberta T2N 1N4, Canada

Publisher

American Chemical Society (ACS)

Subject

Physical and Theoretical Chemistry

Link

https://pubs.acs.org/doi/pdf/10.1021/jp3055558

Reference49 articles.

1. Hetero-π-systems from 2+2 cycloreversions. Part 1. Gusel'nikov–Flowers route to silenes and origination of the chemistry of doubly bonded silicon

2. Kinetics of silicon carbide CVD: surface decomposition of silacyclobutane and methylsilane

3. Chemical vapor deposition of silicon carbide from 1,3-disilacyclobutane

4. Growth of crystalline 3C‐SiC on Si at reduced temperatures by chemical vapor deposition from silacyclobutane

5. Effect of carbonization on the growth of 3C‐SiC on Si (111) by silacyclobutane

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