Determination of trace impurities in organometallic semiconductor-grade reagents and process chemicals with electrothermal vaporization–inductively coupled plasma atomic emission spectrometry-Reference-Cited by-同舟云学术

Determination of trace impurities in organometallic semiconductor-grade reagents and process chemicals with electrothermal vaporization–inductively coupled plasma atomic emission spectrometry

Published:1994 Issue:10 Volume:9 Page:1121-1128
ISSN:0267-9477
Container-title:J. Anal. At. Spectrom.
language:en
Short-container-title:J. Anal. At. Spectrom.

Author:

Argentine Mark D.,Krushevska Antoaneta,Barnes Ramon M.

Publisher

Royal Society of Chemistry (RSC)

Subject

Spectroscopy,Analytical Chemistry

Link

http://pubs.rsc.org/en/content/articlepdf/1994/JA/JA9940901121

Reference25 articles.

1. Purity and purification of source materials for III–V MOCVD

2. Growth of high-purity GaAs epilayers by MOCVD and their applications to microwave MESFET's

3. Residual impurities in epitaxial layers grown by MOVPE

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