An i-line molecular glass photoresist for high resolution patterning
Author:
Publisher
Royal Society of Chemistry (RSC)
Subject
General Chemical Engineering,General Chemistry
Link
http://pubs.rsc.org/en/content/articlepdf/2013/RA/C3RA45130E
Reference26 articles.
1. Novolak design concept for high performance positive photoresists
2. Novolac-based resists
3. Novolak resins with high thermal stability, high resolution, improved photospeed and etch characteristics for advanced photoresist applications
4. Surface plasmon resonant interference nanolithography technique
5. Sub-Diffraction-Limited Optical Imaging with a Silver Superlens
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