Initial stage of atomic layer deposition of 2D-MoS2 on a SiO2 surface: a DFT study
Author:
Affiliation:
1. Department of Applied Physics
2. Eindhoven University of Technology
3. Eindhoven
4. The Netherlands
Abstract
In this study, we investigate the reactions involving Atomic Layer Deposition (ALD) of 2D-MoS2 from the heteroleptic precursor Mo(NMe2)2(NtBu)2 and H2S as the co-reagent on a SiO2(0001) surface by means of density functional theory (DFT).
Funder
H2020 European Research Council
Publisher
Royal Society of Chemistry (RSC)
Subject
Physical and Theoretical Chemistry,General Physics and Astronomy
Link
http://pubs.rsc.org/en/content/articlepdf/2018/CP/C8CP00210J
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