Combinatorial atmospheric pressure chemical vapour deposition (cAPCVD) of a mixed vanadium oxide and vanadium oxynitride thin film
Author:
Publisher
Royal Society of Chemistry (RSC)
Subject
Materials Chemistry,General Chemistry
Link
http://pubs.rsc.org/en/content/articlepdf/2009/JM/B817429F
Reference36 articles.
1. A combinatorial approach to phase synthesis and characterisation in atmospheric pressure chemical vapour deposition
2. Combinatorial initiated chemical vapor deposition (iCVD) for polymer thin film discovery
3. The Use of Combinatorial Chemical Vapor Deposition in the Synthesis of Ti3-δO4N with 0.06 < δ < 0.25: A Titanium Oxynitride Phase Isostructural to Anosovite
4. Formation of VN from VCl 4 and NH(SiMe 3 ) 2 by APCVD − a Potential Solar Control Coating
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