Robust spin-on-glass poly(methyl)silsesquioxane-based low-k materials derived from a cyclic siloxane precursor-Reference-Cited by-同舟云学术

Robust spin-on-glass poly(methyl)silsesquioxane-based low-k materials derived from a cyclic siloxane precursor

Published:2015 Issue:82 Volume:5 Page:66511-66517
ISSN:2046-2069
Container-title:RSC Advances
language:en
Short-container-title:RSC Adv.

Author:

Lee Albert S.¹²³⁴,Oh Sung Yeoun¹²³⁴,Choi Seung-Sock¹²³⁴,Lee He Seung¹²³⁴,Hwang Seung Sang¹²³⁴⁵,Baek Kyung-Youl¹²³⁴⁵

Affiliation:

1. Materials Architecturing Research Center

2. Korea Institute of Science and Technology

3. Seoul 136-791

4. Republic of Korea

5. Nanomaterials Science and Engineering

Abstract

Low dielectric constant poly(methyl)silsesquioxane spin-on-glass resins incorporating a cyclic precursor exhibited exceptional mechanical properties to withstand CMP processes.

Publisher

Royal Society of Chemistry (RSC)

Subject

General Chemical Engineering,General Chemistry

Link

http://pubs.rsc.org/en/content/articlepdf/2015/RA/C5RA11110B

Reference27 articles.

1. Low Dielectric Constant Materials

2. Molecular Network Reinforcement of Sol–Gel Glasses

3. Application of the Protection/Deprotection Strategy to the Science of Porous Materials

4. High-performance ultralow dielectric constant carbon-bridged mesoporous organosilica films for advanced interconnects

5. Film Property Requirements for Hermetic Low-k a-SiOxCyNz:H Dielectric Barriers

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