Highly hydroxylated hafnium clusters are accessible to high resolution EUV photoresists under small energy doses-Reference-Cited by-同舟云学术

Highly hydroxylated hafnium clusters are accessible to high resolution EUV photoresists under small energy doses

Published:2024 Issue:1 Volume:6 Page:197-208
ISSN:2516-0230
Container-title:Nanoscale Advances
language:en
Short-container-title:Nanoscale Adv.

Author:

Tseng Yu-Fang¹,Liao Pin-Chia¹,Chen Po-Hsiung²³,Gau Tsai-Sheng²³,Lin Burn-Jeng²³,Chiu Po-Wen²³,Liu Jui-Hsiung¹^ORCID

Affiliation:

1. Department of Chemistry, National Tsing Hua University, Hsinchu 30013, Taiwan

2. TSMC-NTHU Joint Research Center, National Tsing Hua University, Hsinchu 30013, Taiwan

3. College of Semiconductor Research, National Tsing Hua University, Hsinchu 30013, Taiwan

Abstract

This work reports the success in accessing high-resolution negative-tone EUV photoresists without radical chain growth in the aggregation mechanism.

Funder

National Science and Technology Council

Taiwan Semiconductor Manufacturing Company

Ministry of Science and Technology, Taiwan

National Synchrotron Radiation Research Center

Publisher

Royal Society of Chemistry (RSC)

Subject

General Engineering,General Materials Science,General Chemistry,Atomic and Molecular Physics, and Optics,Bioengineering

Link

http://pubs.rsc.org/en/content/articlepdf/2024/NA/D3NA00508A

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