Design, development, EUVL applications and nano mechanical properties of a new HfO2 based hybrid non-chemically amplified resist-Reference-Cited by-同舟云学术

Design, development, EUVL applications and nano mechanical properties of a new HfO2 based hybrid non-chemically amplified resist

Published:2016 Issue:71 Volume:6 Page:67143-67149
ISSN:2046-2069
Container-title:RSC Advances
language:en
Short-container-title:RSC Adv.

Author:

Reddy Pulikanti Guruprasad¹²³,Mamidi Narsimha¹²³^ORCID,Kumar Pawan⁴²³,Sharma Satinder K.⁴²³,Ghosh Subrata¹²³,Gonsalves Kenneth E.¹²³,Pradeep Chullikkattil P.¹²³

Affiliation:

1. School of Basic Sciences

2. Indian Institute of Technology Mandi

3. India

4. School of Computing and Electrical Engineering

Abstract

A new HfO₂-based hybrid n-CAR resist material has been developed for EUVL applications and its nano-mechanical properties have been reported.

Funder

Intel Corporation

Publisher

Royal Society of Chemistry (RSC)

Subject

General Chemical Engineering,General Chemistry

Link

http://pubs.rsc.org/en/content/articlepdf/2016/RA/C6RA10575K

Reference27 articles.

1. Resist Materials and Processes for Extreme Ultraviolet Lithography

2. Evaluation of an advanced dual hard mask stack for high resolution pattern transfer

3. Characterization of the Photoacid Diffusion Length and Reaction Kinetics in EUV Photoresists with IR Spectroscopy

4. Nanoparticle photoresists from HfO2 and ZrO2 for EUV patterning

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