A combined AIMD and DFT study of the low-energy radiation responses of GaN

Author:

Jiang Ming1ORCID,Cheng Nuo2,Zhu Xin-Yu2,Hu Xuan-Liang3,Wang Zi-Han3,Liu Ning3,Song Shuo3,Wang Sheng-Ze3,Liu Xu-Sheng4ORCID,Singh Chandra Veer56ORCID

Affiliation:

1. Institutes of Physical Science and Information Technology, Anhui University, Hefei 230601, China

2. School of Materials Science and Engineering, Anhui University, Hefei, 230601, China

3. Stony Brook Institute at Anhui University, Anhui University, Hefei 230601, China

4. College of Physics and Engineering Technology, Chengdu Normal University, Chengdu 611130, China

5. Department of Materials Science and Engineering, University of Toronto, 184 College Street, Suite 140, Toronto, ON M5S 3E4, Canada

6. Department of Mechanical and Industrial Engineering, University of Toronto, 5 King's College Road, Toronto, ON M5S 3G8, Canada

Abstract

Although GaN is a promising candidate for semiconductor devices, degradation of GaN-based device performance may occur when the device is bombarded by high-energy charged particles.

Funder

Anhui Provincial Department of Education

Chengdu Normal University

Publisher

Royal Society of Chemistry (RSC)

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