Theoretical modeling of ice lithography on amorphous solid water

Author:

Liu Tao1,Tong Xujie1,Tian Shuoqiu1,Xie Yuying1,Zhu Mingsai1,Feng Bo1,Pan Xiaohang1,Zheng Rui23ORCID,Wu Shan23,Zhao Ding23ORCID,Chen Yifang1ORCID,Lu Bingrui1ORCID,Qiu Min23ORCID

Affiliation:

1. Nanolithography and Application Research Group, State Key Laboratory of ASIC and System, School of Information Science and Technology, Fudan University, Shanghai 200433, China

2. Key Laboratory of 3D Micro/Nano Fabrication and Characterization of Zhejiang Province, School of Engineering, Westlake University, 18 Shilongshan Road, Hangzhou 310024, Zhejiang Province, China

3. Institute of Advanced Technology, Westlake Institute for Advanced Study, 18 Shilongshan Road, Hangzhou 310024, Zhejiang Province, China

Abstract

This paper reports on the theoretical modeling of ice lithography (IL) on amorphous solid water for the first time and fills the theoretical study gap on ice lithography as a whole, which will hopefully provide advanced IL-nanofabrication with important guidance.

Funder

National Natural Science Foundation of China

Science and Technology Commission of Shanghai Municipality

Publisher

Royal Society of Chemistry (RSC)

Subject

General Materials Science

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