Photolithography in the vacuum ultraviolet (172 nm) with sub-400 nm resolution: photoablative patterning of nanostructures and optical components in bulk polymers and thin films on semiconductors

Author:

Mironov Andrey E.12345ORCID,Kim Jinhong12345ORCID,Huang Yin12345,Steinforth Austin W.12345,Sievers Dane J.12345,Eden J. Gary12345

Affiliation:

1. Laboratory for Optical Physics and Engineering

2. Department of Electrical and Computer Engineering

3. Grainger College of Engineering

4. University of Illinois

5. Urbana

Abstract

Precision photoablation of bulk polymers or films with incoherent 172 nm radiation from flat, microplasma array-powered lamps provides the foundation for a photolithographic process in which an acrylic or other polymer serves as a dry photoresist.

Funder

Air Force Office of Scientific Research

Publisher

Royal Society of Chemistry (RSC)

Subject

General Materials Science

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