UV/ozone-assisted tribochemistry-induced nanofabrication on Si(100) surfaces-Reference-Cited by-同舟云学术

UV/ozone-assisted tribochemistry-induced nanofabrication on Si(100) surfaces

Published:2017 Issue:63 Volume:7 Page:39651-39656
ISSN:2046-2069
Container-title:RSC Advances
language:en
Short-container-title:RSC Adv.

Author:

Wang Hongbo¹²³⁴⁵^ORCID,Yu Bingjun¹²³⁴⁵,Jiang Shulan¹²³⁴⁵,Jiang Liang¹²³⁴⁵,Qian Linmao¹²³⁴⁵^ORCID

Affiliation:

1. Tribology Research Institute

2. State Key Laboratory of Traction Power

3. Southwest Jiaotong University

4. Chengdu 610031

5. China

Abstract

UV/ozone oxidation provides a simple and efficient method to prepare super-hydrophilic SiO_x films for tribochemistry-induced nanofabrication on Si substrates.

Funder

National Natural Science Foundation of China

Publisher

Royal Society of Chemistry (RSC)

Subject

General Chemical Engineering,General Chemistry

Link

http://pubs.rsc.org/en/content/articlepdf/2017/RA/C7RA07198A

Reference27 articles.

1. Silicon nanostructures for photonics and photovoltaics

2. Ultrafast and direct imprint of nanostructures in silicon

3. Nondestructive nanofabrication on Si(100) surface by tribochemistry-induced selective etching

4. Nondestructive tribochemistry-assisted nanofabrication on GaAs surface

5. Friction-induced nanofabrication on monocrystalline silicon

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