Role of the electronically-active amorphous state in low-temperature processed In2O3 thin-film transistors
Author:
Affiliation:
1. Materials Science and Engineering Division
2. National Institute of Standards and Technology (NIST)
3. Gaithersburg
4. USA
Abstract
Process-structure-transport relationships in low-temperature-processed, blade-coated In2O3 transistors using sol–gel and combustion chemistries are explored with X-ray scattering techniques. Electron mobility of ≈4.5 cm2 V−1 s−1 is achieved at ≈220 °C.
Funder
National Institute of Standards and Technology
U.S. Department of Energy
Publisher
Royal Society of Chemistry (RSC)
Subject
Microbiology
Link
http://pubs.rsc.org/en/content/articlepdf/2020/MA/D0MA00072H
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