Author:
Wang Xiao-Dong,Chen Bo,Wang Hai-Feng,Chen Bin,Liu Shi-Jie,Cui Zhong-Xu,Li Bo,Wang Jun-Bo,Wang Shan-Meng,Li Yun-Peng
Abstract
Amorphous germanium (a-Ge) films in the thickness range of 5.2–370.7 nm were prepared by radio frequency magnetron sputtering. Spectroscopic ellipsometry analysis shows that less than 3% of medium-range order exists in a-Ge under the reported deposition conditions.
Publisher
International Union of Crystallography (IUCr)
Subject
General Biochemistry, Genetics and Molecular Biology
Cited by
3 articles.
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