Observation of interfacial atomic steps during silicon oxidation
Author:
Publisher
Springer Science and Business Media LLC
Subject
Multidisciplinary
Link
http://www.nature.com/articles/340128a0.pdf
Reference23 articles.
1. Goodnick, S. M. et al. Phys. Rev. B 32, 8171–8185 (1985).
2. Hahn, P. O. & Henzler, M. J. Vac. Sci. Technol. A 2, 574–583 (1984).
3. Aspnes, D. E. & Theeten, J. B. J. electric. Soc. 127, 1359–1365 (1980).
4. Jackman, T. E., McDonald, J. R., Feldman, L. C., Silverman, P. J. & Stensgaard, I. Surf. Sci. 100, 35–42 (1980).
5. Hollinger, G. & Himpsel, F. J. Appl. Phys. Lett. 44, 93–95 (1983).
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