Low-temperature atomic layer epitaxy of AlN ultrathin films by layer-by-layer, in-situ atomic layer annealing
Author:
Publisher
Springer Science and Business Media LLC
Subject
Multidisciplinary
Link
http://www.nature.com/articles/srep39717.pdf
Reference34 articles.
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5. Shim, J. H., Chao, C. C., Huang, H. & Prinz, F. B. Atomic layer deposition of yttria-stabilized zirconia for solid oxide fuel cells. Chem Mater 19, 3850–3854, doi: 10.1021/cm070913t (2007).
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