Numerical Simulations of Directed Self-Assembly in Diblock Copolymer Films using Zone Annealing and Pattern Templating
Author:
Publisher
Springer Science and Business Media LLC
Subject
Multidisciplinary
Link
http://www.nature.com/articles/s41598-017-05565-w.pdf
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3. Park, H. J., Kang, M.-G. & Guo, L. J. Large area high density sub-20 nm sio2 nanostructures fabricated by block copolymer template for nanoimprint lithography. Acs Nano 3, 2601–2608 (2009).
4. Harrison, C., Park, M., Chaikin, P. M., Register, R. A. & Adamson, D. H. Lithography with a pattern of block copolymer microdomains as a positive or negative resist (ACS Publications, 1998).
5. Salaun, M. et al. Fabrication of highly ordered sub-20 nm silicon nanopillars by block copolymer lithography combined with resist design. Journal of Materials Chemistry C 1, 3544–3550 (2013).
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