Large Area High Density Sub-20 nm SiO2 Nanostructures Fabricated by Block Copolymer Template for Nanoimprint Lithography
Author:
Affiliation:
1. Macromolecular Science and Engineering
2. Department of Electrical Engineering and Computer Science, The University of Michigan, Ann Arbor, Michigan 48109
Publisher
American Chemical Society (ACS)
Subject
General Physics and Astronomy,General Engineering,General Materials Science
Link
https://pubs.acs.org/doi/pdf/10.1021/nn900701p
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