Reference-Free Total Reflection X-ray Fluorescence Analysis of Semiconductor Surfaces with Synchrotron Radiation
Author:
Affiliation:
1. Physikalisch-Technische Bundesanstalt, Abbestrasse 2-12, 10587 Berlin, Germany
Publisher
American Chemical Society (ACS)
Subject
Analytical Chemistry
Link
https://pubs.acs.org/doi/pdf/10.1021/ac071236p
Reference56 articles.
1. Total reflection x‐ray fluorescence spectroscopy using synchrotron radiation for wafer surface trace impurity analysis (invited)
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3. Synchrotron radiation induced total reflection X-ray fluorescence of low Z elements on Si wafer surfaces at SSRL — comparison of excitation geometries and conditions
4. Whole-Surface Analysis of Semiconductor Wafers by Accumulating Short-Time Mapping Data of Total-Reflection X-ray Fluorescence Spectrometry
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