Whole-Surface Analysis of Semiconductor Wafers by Accumulating Short-Time Mapping Data of Total-Reflection X-ray Fluorescence Spectrometry-Reference-Cited by-同舟云学术

Whole-Surface Analysis of Semiconductor Wafers by Accumulating Short-Time Mapping Data of Total-Reflection X-ray Fluorescence Spectrometry

Published:2002-01-26 Issue:5 Volume:74 Page:1104-1110
ISSN:0003-2700
Container-title:Analytical Chemistry
language:en
Short-container-title:Anal. Chem.

Author:

Mori Yoshihiro¹,Uemura Kenichi¹,Iizuka Yoshinori¹

Affiliation:

1. Advanced Technology Research Laboratories, Nippon Steel Corporation, c/o Wacker-NSCE Corporation, 3434 Shimata, Hikari, Yamaguchi 743-0063, Japan, and School of Engineering, The University of Tokyo, 7-3-1 Hongo, Bunkyo-ku, Tokyo 113-8656, Japan

Publisher

American Chemical Society (ACS)

Subject

Analytical Chemistry

Link

https://pubs.acs.org/doi/pdf/10.1021/ac0112061

Reference18 articles.

1. Improvement of Total Reflection X-ray Fluorescence (TXRF) spectrochemical analysis for silicon wafers

Cited by 25 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Total reflection X-ray fluorescence;Physical Sciences Reviews;2019-03-30

2. Behavior of Transition Metals Penetrating Silicon Substrate through SiO2and Si3N4Films by Arsenic Ion Implantation and Annealing;ECS Journal of Solid State Science and Technology;2015

3. Different Fields of Applications;Total-Reflection X-Ray Fluorescence Analysis and Related Methods;2014-12-19

4. Total reflection X-ray fluorescence analysis: Physical foundations and analytical application (A review);Inorganic Materials;2011-11-20

5. Total-Reflection X-Ray Fluorescence (TXRF) Analysis;Surface and Thin Film Analysis;2011-04-12