Whole-Surface Analysis of Semiconductor Wafers by Accumulating Short-Time Mapping Data of Total-Reflection X-ray Fluorescence Spectrometry
Author:
Affiliation:
1. Advanced Technology Research Laboratories, Nippon Steel Corporation, c/o Wacker-NSCE Corporation, 3434 Shimata, Hikari, Yamaguchi 743-0063, Japan, and School of Engineering, The University of Tokyo, 7-3-1 Hongo, Bunkyo-ku, Tokyo 113-8656, Japan
Publisher
American Chemical Society (ACS)
Subject
Analytical Chemistry
Link
https://pubs.acs.org/doi/pdf/10.1021/ac0112061
Reference18 articles.
1. Improvement of Total Reflection X-ray Fluorescence (TXRF) spectrochemical analysis for silicon wafers
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