Dendrimer Monolayers as Negative and Positive Tone Resists for Scanning Probe Lithography-Reference-Cited by-同舟云学术

Dendrimer Monolayers as Negative and Positive Tone Resists for Scanning Probe Lithography

Published:2004-04-17 Issue:5 Volume:4 Page:889-893
ISSN:1530-6984
Container-title:Nano Letters
language:en
Short-container-title:Nano Lett.

Author:

Rolandi Marco¹,Suez Itai¹,Dai Hongjie¹,Fréchet Jean M. J.¹

Affiliation:

1. Department of Chemistry and Laboratory for Advanced Materials, Stanford University, Stanford, California 94305, Department of Chemistry, University of California, Berkeley, California 94720-1460 and Division of Material Sciences, Lawrence Berkeley National Laboratory, Berkeley, California 94720

Publisher

American Chemical Society (ACS)

Subject

Mechanical Engineering,Condensed Matter Physics,General Materials Science,General Chemistry,Bioengineering

Link

https://pubs.acs.org/doi/pdf/10.1021/nl049700i

Reference30 articles.

1. Scanning probes as a lithography tool for nanostructures

2. Centimeter scale atomic force microscope imaging and lithography

3. Terabit-per-square-inch data storage with the atomic force microscope

4. Exploiting the properties of carbon nanotubes for nanolithography

5. Modification of hydrogen‐passivated silicon by a scanning tunneling microscope operating in air

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