Study of a Two-Stage Photobase Generator for Photolithography in Microelectronics-Reference-Cited by-同舟云学术

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Study of a Two-Stage Photobase Generator for Photolithography in Microelectronics

Published:2012-11-06 Issue:5 Volume:78 Page:1735-1741
ISSN:0022-3263
Container-title:The Journal of Organic Chemistry
language:en
Short-container-title:J. Org. Chem.

Author:

Turro Nicholas J.¹,Li Yongjun¹,Jockusch Steffen¹,Hagiwara Yuji²,Okazaki Masahiro²,Mesch Ryan A.²,Schuster David I.³,Willson C. Grant²

Affiliation:

1. Department of Chemistry, Columbia University, New York, New York 10027, United States

2. Chemistry Department, University of Texas, Austin, Texas 78741, United States

3. Department of Chemistry, New York University, New York, New York 10003, United States

Publisher

American Chemical Society (ACS)

Subject

Organic Chemistry

Link

https://pubs.acs.org/doi/pdf/10.1021/jo302149u

Reference16 articles.

1. Immersion Lithography: Photomask and Wafer-Level Materials

2. A New Materials-based Pitch Division Technique

3. Photobase generator enabled pitch division: a progress report

4. Design and Synthesis of a Photoaromatization-Based Two-Stage Photobase Generator for Pitch Division Lithography

5. Type II photoelimination and photocyclization of ketones

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