Photobase generator enabled pitch division: a progress report-Reference-Cited by-同舟云学术

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Photobase generator enabled pitch division: a progress report

Published:2011-03-17 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
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Author:

Gu Xinyu,Cho Younjin,Kawakami Takanori,Hagiwara Yuji,Rawlings Brandon,Mesch Ryan,Ogata Toshiyuki,Kim Taeho,Seshimo Takehiro,Wang Wade,Sundaresan Arun K.,Turro Nicholas J.,Gronheid Roel,Blackwell James,Bristol Robert,Willson C. Grant

Publisher

SPIE

Cited by 5 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Development of [CpRu(η 6 -benzylcarbamate)]X salts as two-stage photobase generators;Inorganica Chimica Acta;2014-10

2. Development of KrF hybrid resist for a dual-isolation application;SPIE Proceedings;2013-04-16

3. Single component photoacid/photobase generators: potential applications in double patterning photolithography;Journal of Materials Chemistry C;2013

4. Study of a Two-Stage Photobase Generator for Photolithography in Microelectronics;The Journal of Organic Chemistry;2012-11-06

5. Design and Synthesis of a Photoaromatization-Based Two-Stage Photobase Generator for Pitch Division Lithography;The Journal of Organic Chemistry;2012-11-05

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