Controllable Formation of Nanoscale Patterns on TiO2 by Conductive-AFM Nanolithography-Reference-Cited by-同舟云学术

Controllable Formation of Nanoscale Patterns on TiO2 by Conductive-AFM Nanolithography

Published:2008-07-23 Issue:16 Volume:24 Page:8944-8949
ISSN:0743-7463
Container-title:Langmuir
language:en
Short-container-title:Langmuir

Author:

Garipcan B.¹,Winters J.¹,Atchison J. S.¹,Cathell M. D.¹,Schiffman J. D.¹,Leaffer O. D.¹,Nonnenmann S. S.¹,Schauer C. L.¹,Pişkin E.¹,Nabet B.¹,Spanier J. E.¹

Affiliation:

1. Department of Chemical Engineering, Bioengineering Division, Hacettepe University, Beytepe, Ankara, 06800, Turkey, and Department of Materials Science and Engineering, Drexel University, Philadelphia Pennsylvania 19104

Publisher

American Chemical Society (ACS)

Subject

Electrochemistry,Spectroscopy,Surfaces and Interfaces,Condensed Matter Physics,General Materials Science

Link

https://pubs.acs.org/doi/pdf/10.1021/la800911x

Reference57 articles.

1. Room temperature nanofabrication of atomically registeredheteromolecular organosilicon nanostructures using multistepfeedback controlled lithography

2. Direct Patterning of Modified Oligonucleotides on Metals and Insulators by Dip-Pen Nanolithography

3. Room Temperature Negative Differential Resistance through Individual Organic Molecules on Silicon Surfaces

4. Kinetics and Mechanism of Atomic Force Microscope Local Oxidation on Hydrogen-Passivated Silicon in Inert Organic Solvents

5. Molecular Memories That Survive Silicon Device Processing and Real-World Operation

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