The use of time resolved aerosol assisted chemical vapour deposition in mapping metal oxide thin film growth and fine tuning functional properties-Reference-Cited by-同舟云学术

The use of time resolved aerosol assisted chemical vapour deposition in mapping metal oxide thin film growth and fine tuning functional properties

Published:2015 Issue:9 Volume:3 Page:4811-4819
ISSN:2050-7488
Container-title:Journal of Materials Chemistry A
language:en
Short-container-title:J. Mater. Chem. A

Author:

Chadwick Nicholas P.¹²³⁴⁵,Sathasivam Sanjayan¹²³⁴⁵,Bawaked Salem M.⁶⁷⁸⁹¹⁰,Mokhtar Mohamed⁶⁷⁸⁹¹⁰,Althabaiti Shaeel A.⁶⁷⁸⁹¹⁰,Basahel Sulaiman N.⁶⁷⁸⁹¹⁰,Parkin Ivan P.¹²³⁴⁵,Carmalt Claire J.¹²³⁴⁵

Affiliation:

1. Materials Chemistry Research Centre

2. Department of Chemistry

3. University College London

4. London

5. UK

6. Chemistry Department

7. Faculty of Science

8. King Abdulaziz University

9. Saudi Arabia

10. Surface Chemistry and Catalytic Studies Group

Abstract

Time resolved analysis of a thin film has allowed, for the first time, analysis of how thin film growth occurs and changes over time by aerosol assisted CVD.

Publisher

Royal Society of Chemistry (RSC)

Subject

General Materials Science,Renewable Energy, Sustainability and the Environment,General Chemistry

Link

http://pubs.rsc.org/en/content/articlepdf/2015/TA/C4TA05922K

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4. Direct Growth of TiO2 Nanosheet Arrays on Carbon Fibers for Highly Efficient Photocatalytic Degradation of Methyl Orange

5. Visible Light-Induced Water Oxidation on Mesoscopic α-Fe2O3 Films Made by Ultrasonic Spray Pyrolysis

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