Atomically Thin Metal–Dielectric Heterostructures by Atomic Layer Deposition-Reference-Cited by-同舟云学术

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Atomically Thin Metal–Dielectric Heterostructures by Atomic Layer Deposition

Published:2023-04-25 Issue:18 Volume:15 Page:22626-22636
ISSN:1944-8244
Container-title:ACS Applied Materials & Interfaces
language:en
Short-container-title:ACS Appl. Mater. Interfaces

Author:

Paul Pallabi¹²^ORCID,Schmitt Paul¹²,Sigurjónsdóttir Vilborg Vala¹²,Hanemann Kevin²,Felde Nadja²,Schröder Sven²,Otto Felix³^ORCID,Gruenewald Marco³^ORCID,Fritz Torsten³^ORCID,Roddatis Vladimir⁴,Tünnermann Andreas¹²,Szeghalmi Adriana¹²^ORCID

Affiliation:

1. Institute of Applied Physics and Abbe Center of Photonics, Friedrich Schiller University Jena, Albert-Einstein-Straße 15, 07745 Jena, Germany

2. Center of Excellence in Photonics, Fraunhofer Institute for Applied Optics and Precision Engineering IOF, Albert-Einstein-Straße 7, 07745 Jena, Germany

3. Institute of Solid-State Physics, Friedrich Schiller University Jena, Helmholtzweg 5, 07743 Jena, Germany

4. Institute of Materials Physics, University of Göttingen, Friedrich-Hund-Platz 1, 37077 Göttingen, Germany

Funder

Deutsche Forschungsgemeinschaft

Fraunhofer-Gesellschaft

Publisher

American Chemical Society (ACS)

Subject

General Materials Science

Link

https://pubs.acs.org/doi/pdf/10.1021/acsami.2c22590

Reference53 articles.

1. Tunable plasmons in ultrathin metal films

2. Ultrastable and Atomically Smooth Ultrathin Silver Films Grown on a Copper Seed Layer

3. Influence of seed layers on the reflectance of sputtered aluminum thin films

4. Enhancing Second Harmonic Generation in Gold Nanoring Resonators Filled with Lithium Niobate

5. Function-switchable metal/semiconductor junction enables efficient photocatalytic overall water splitting with selective water oxidation products

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