Role of Oxygen Source on Buried Interfaces in Atomic-Layer-Deposited Ferroelectric Hafnia–Zirconia Thin Films-Reference-Cited by-同舟云学术

Role of Oxygen Source on Buried Interfaces in Atomic-Layer-Deposited Ferroelectric Hafnia–Zirconia Thin Films

Published:2022-09-07 Issue:37 Volume:14 Page:42232-42244
ISSN:1944-8244
Container-title:ACS Applied Materials & Interfaces
language:en
Short-container-title:ACS Appl. Mater. Interfaces

Author:

Hsain Hanan Alexandra¹²^ORCID,Lee Younghwan¹,Lancaster Suzanne²^ORCID,Materano Monica²^ORCID,Alcala Ruben²,Xu Bohan²^ORCID,Mikolajick Thomas²³^ORCID,Schroeder Uwe²^ORCID,Parsons Gregory N.⁴^ORCID,Jones Jacob L.¹^ORCID

Affiliation:

1. Materials Science and Engineering Department, North Carolina State University, 911 Partners Way, Raleigh, North Carolina 27695, United States

2. NaMLab gGmbH, Nöthnitzer Strasse 64a, 01187 Dresden, Germany

3. TU Dresden, Chair of Nanoelectronics, Nöthnitzer Strasse 64a, 01187 Dresden, Germany

4. Chemical and Biomolecular Engineering Department, North Carolina State University, 911 Partners Way, Raleigh, North Carolina 27695, United States

Funder

Division of Graduate Education

Deutsche Forschungsgemeinschaft

Division of Engineering Education and Centers

National Science Foundation

Publisher

American Chemical Society (ACS)

Subject

General Materials Science

Link

https://pubs.acs.org/doi/pdf/10.1021/acsami.2c11073

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5. Thin HfxZr1-xO2Films: A New Lead-Free System for Electrostatic Supercapacitors with Large Energy Storage Density and Robust Thermal Stability

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