Direct-Write Atomic Layer Deposition of High-Quality Pt Nanostructures: Selective Growth Conditions and Seed Layer Requirements-Reference-Cited by-同舟云学术

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Direct-Write Atomic Layer Deposition of High-Quality Pt Nanostructures: Selective Growth Conditions and Seed Layer Requirements

Published:2013-05-08 Issue:20 Volume:117 Page:10788-10798
ISSN:1932-7447
Container-title:The Journal of Physical Chemistry C
language:en
Short-container-title:J. Phys. Chem. C

Author:

Mackus A. J. M.¹,Thissen N. F. W.¹,Mulders J. J. L.²,Trompenaars P. H. F.²,Verheijen M. A.¹³,Bol A. A.¹,Kessels W. M. M.¹

Affiliation:

1. Department of Applied Physics, Eindhoven University of Technology, P.O. Box 513, 5600 MB Eindhoven, The Netherlands

2. FEI Electron Optics, Achtseweg Noord 5, 5600 KA Eindhoven, The Netherlands

3. Philips Innovation Services, High Tech Campus 11, 5656 AE Eindhoven, The Netherlands

Publisher

American Chemical Society (ACS)

Subject

Surfaces, Coatings and Films,Physical and Theoretical Chemistry,General Energy,Electronic, Optical and Magnetic Materials

Link

https://pubs.acs.org/doi/pdf/10.1021/jp402260j

Reference53 articles.

1. Atomic Structure of Graphene on SiO2

2. Reliable processing of graphene using metal etchmasks

3. Intrinsic Response of Graphene Vapor Sensors

4. Investigation of the influence on graphene by using electron-beam and photo-lithography

5. A review of focused ion beam applications in microsystem technology

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