Direct n- to p-Type Channel Conversion in Monolayer/Few-Layer WS2 Field-Effect Transistors by Atomic Nitrogen Treatment

Author:

Tang Baoshan12,Yu Zhi Gen3ORCID,Huang Li4ORCID,Chai Jianwei1,Wong Swee Liang1ORCID,Deng Jie1,Yang Weifeng1ORCID,Gong Hao2ORCID,Wang Shijie1,Ang Kah-Wee4ORCID,Zhang Yong-Wei3,Chi Dongzhi1ORCID

Affiliation:

1. Institute of Materials Research and Engineering, A*STAR (Agency for Science, Technology and Research), 2 Fusionopolis Way, Innovis, 138634 Singapore

2. Department of Materials Science and Engineering, National University of Singapore, 117576 Singapore

3. Institute of High Performance Computing, A*STAR (Agency for Science, Technology and Research), 1 Fusionopolis Way, Connexis North, 138632 Singapore

4. Department of Electrical and Computer Engineering, National University of Singapore, 117576 Singapore

Funder

Ministry of Education - Singapore

Agency for Science, Technology and Research

Publisher

American Chemical Society (ACS)

Subject

General Physics and Astronomy,General Engineering,General Materials Science

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