Remote Gating of Schottky Barrier for Transistors and Their Vertical Integration
Author:
Affiliation:
1. Department of Chemical and Biomolecular Engineering, Sogang University, Seoul 04107, Korea
2. Department of Chemical and Biomolecular Engineering, Yonsei University, Seoul 03722, Korea
Funder
National Research Foundation of Korea
Publisher
American Chemical Society (ACS)
Subject
General Physics and Astronomy,General Engineering,General Materials Science
Link
https://pubs.acs.org/doi/pdf/10.1021/acsnano.9b02243
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