Area-Selective Atomic Layer Deposition of Metal Oxides on DNA Nanostructures and Its Applications
Author:
Affiliation:
1. Department of Chemistry, University of Pittsburgh, Pittsburgh, Pennsylvania 15260, United States
2. Department of Chemistry, Missouri University of Science and Technology, Rolla, Missouri 65409, United States
Funder
Division of Computing and Communication Foundations
Office of Naval Research
Publisher
American Chemical Society (ACS)
Subject
General Physics and Astronomy,General Engineering,General Materials Science
Link
https://pubs.acs.org/doi/pdf/10.1021/acsnano.0c04493
Reference39 articles.
1. Area-Selective Atomic Layer Deposition of TiN, TiO2, and HfO2 on Silicon Nitride with inhibition on Amorphous Carbon
2. Vapor-deposited octadecanethiol masking layer on copper to enable area selective Hf3N4 atomic layer deposition on dielectrics studied by in situ spectroscopic ellipsometry
3. Selective Ru ALD as a Catalyst for Sub-Seven-Nanometer Bottom-Up Metal Interconnects
4. Metal oxide semiconductor nanomembrane–based soft unnoticeable multifunctional electronics for wearable human-machine interfaces
5. Metal oxide thin films and nanostructures for self-cleaning applications: current status and future prospects
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