Selective Ru ALD as a Catalyst for Sub-Seven-Nanometer Bottom-Up Metal Interconnects
Author:
Affiliation:
1. KU Leuven, Department of Chemistry, Faculty of Science, B-3001 Leuven, Belgium
2. Imec, Kapeldreef 75, B-3001 Leuven, Belgium
Funder
IMEC
Publisher
American Chemical Society (ACS)
Subject
General Materials Science
Link
https://pubs.acs.org/doi/pdf/10.1021/acsami.7b07811
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