Multimaterial Self-Aligned Nanopatterning by Simultaneous Adjacent Thin Film Deposition and Etching
Author:
Affiliation:
1. Department of Chemical and Biomolecular Engineering, North Carolina State University, Raleigh, North Carolina 27695, United States
Funder
Semiconductor Research Corporation
National Science Foundation
Publisher
American Chemical Society (ACS)
Subject
General Physics and Astronomy,General Engineering,General Materials Science
Link
https://pubs.acs.org/doi/pdf/10.1021/acsnano.1c04086
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4. Mohanty, N.; Smith, J. T.; Huli, L.; Pereira, C.; Raley, A.; Kal, S.; Fonseca, C.; Sun, X.; Burns, R. L.; Farrell, R. A.; Hetzer, D. R.; Metz, A. W.; Ko, A.; Scheer, S. A.; Biolsi, P.; DeVillers, A. EPE Improvement Thru Self-Alignment via Multi-Color Material Integration. In Optical Microlithography XXX; Erdmann, A., Kye, J., Eds. The International Society for Optics and Photonics (SPIE), 2017; Vol. 10147, p 1014704.
5. Levinson, H. J. The Potential of EUV Lithography. In 35th European Mask and Lithography Conference (EMLC 2019); Behringer, U. F., Finders, J., Eds. The International Society for Optics and Photonics (SPIE), 2019; Vol. 1117702, p 2.
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