Highly Ordered Boron Nitride/Epigraphene Epitaxial Films on Silicon Carbide by Lateral Epitaxial Deposition

Author:

Gigliotti James12,Li Xin34,Sundaram Suresh34,Deniz Dogukan1,Prudkovskiy Vladimir15,Turmaud Jean-Philippe1,Hu Yiran1,Hu Yue1,Fossard Frédéric6ORCID,Mérot Jean-Sébastien6,Loiseau Annick6ORCID,Patriarche Gilles7,Yoon Bokwon1,Landman Uzi1,Ougazzaden Abdallah34ORCID,Berger Claire145ORCID,de Heer Walt A.18

Affiliation:

1. School of Physics, Georgia Institute of Technology, Atlanta, Georgia 30332, United States

2. School of Materials Science and Engineering, Georgia Institute of Technology, Atlanta, Georgia 30332, United States

3. School of Electrical and Computer Engineering, Georgia Institute of Technology, GT-Lorraine, 57070 Metz, France

4. Unité Mixte Internationale 2958, CNRS-Georgia Tech, 57070 Metz, France

5. Institut Néel, CNRS-Université Grenoble Alpes, BP166, 38042 Cedex 9 Grenoble, France

6. Laboratoire d’Etude des Microstructures, ONERA-CNRS, Université Paris Saclay, BP 72, F-92322 Châtillon, France

7. Centre de Nanosciences et de Nanotechnologies, CNRS, Université Paris-Saclay, route de Nozay, F-91460 Marcoussis, France

8. Tianjin International Center of Nanoparticles and Nanosystems, Tianjin University, 92 Weijin Road, Nankai District, Tianjin 300072, China

Funder

FACE Foundation

Air Force Office of Scientific Research

H2020 Future and Emerging Technologies

Division of Electrical, Communications and Cyber Systems

Publisher

American Chemical Society (ACS)

Subject

General Physics and Astronomy,General Engineering,General Materials Science

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