Density Functional Theory Study of Oxygen Adsorption on Polymer Surfaces for Atomic-Layer Etching: Implications for Semiconductor Device Fabrication
Author:
Affiliation:
1. Tokyo Electron America, Inc., 2400 Grove Boulevard, Austin, Texas 78741, United States
Publisher
American Chemical Society (ACS)
Subject
General Materials Science
Link
https://pubs.acs.org/doi/pdf/10.1021/acsanm.0c00618
Reference37 articles.
1. Overview of atomic layer etching in the semiconductor industry
2. Atomic Layer Deposition: An Overview
3. Atomic Layer Etching: An Industry Perspective
4. The grand challenges of plasma etching: a manufacturing perspective
5. Challenges of Tailoring Surface Chemistry and Plasma/Surface Interactions to Advance Atomic Layer Etching
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