Nanoscale Patterning of Zinc Oxide from Zinc Acetate Using Electron Beam Lithography for the Preparation of Hard Lithographic Masks-Reference-Cited by-同舟云学术

Nanoscale Patterning of Zinc Oxide from Zinc Acetate Using Electron Beam Lithography for the Preparation of Hard Lithographic Masks

Published:2020-12-16 Issue:1 Volume:4 Page:406-413
ISSN:2574-0970
Container-title:ACS Applied Nano Materials
language:en
Short-container-title:ACS Appl. Nano Mater.

Author:

Chaker Ahmad¹^ORCID,Alty Hayden R.¹,Tian Peng¹,Kotsovinos Anastasios¹,Timco Grigore A.¹,Muryn Christopher A.¹,Lewis Scott M.¹²³^ORCID,Winpenny Richard E. P.¹²^ORCID

Affiliation:

1. Department of Chemistry, The University of Manchester, Oxford Road, Manchester M13 9PL, United Kingdom

2. Sci-Tron Limited, 34 High Street, Aldridge, Walsall WS9 8LZ, United Kingdom

3. Department of Applied Physics and Materials Science, Kavli Nanoscience Institute, California Institute of Technology, 1200 East California Boulevard, MC 107-81, Pasadena, California 91125, United States

Funder

Engineering and Physical Sciences Research Council

University of Manchester

H2020 European Research Council

BP International Centre for Advanced Materials

Publisher

American Chemical Society (ACS)

Subject

General Materials Science

Link

https://pubs.acs.org/doi/pdf/10.1021/acsanm.0c02756

Reference50 articles.