Inverse Metal-Assisted Chemical Etching Produces Smooth High Aspect Ratio InP Nanostructures-Reference-Cited by-同舟云学术

Inverse Metal-Assisted Chemical Etching Produces Smooth High Aspect Ratio InP Nanostructures

Published:2014-12-23 Issue:1 Volume:15 Page:641-648
ISSN:1530-6984
Container-title:Nano Letters
language:en
Short-container-title:Nano Lett.

Author:

Kim Seung Hyun¹,Mohseni Parsian K.¹,Song Yi¹,Ishihara Tatsumi²,Li Xiuling¹

Affiliation:

1. Department of Electrical and Computer Engineering, Micro and Nanotechnology Laboratory, University of Illinois at Urbana-Champaign, Urbana, Illinois 61801, United States

2. Department of Applied Chemistry and Faculty of Engineering, Kyushu University, Fukuoka, Kyushu, Japan

Funder

International Institute for Carbon-Neutral Energy Research, Kyushu University

Publisher

American Chemical Society (ACS)

Subject

Mechanical Engineering,Condensed Matter Physics,General Materials Science,General Chemistry,Bioengineering

Link

https://pubs.acs.org/doi/pdf/10.1021/nl504136c

Reference48 articles.

1. Metal-assisted chemical etching in HF/H2O2 produces porous silicon

2. Metal-Assisted Chemical Etching of Silicon: A Review

3. Metal assisted chemical etching for high aspect ratio nanostructures: A review of characteristics and applications in photovoltaics

4. Nanoscale three dimensional pattern formation in light emitting porous silicon

5. Maskless and Resist-Free Rapid Prototyping of Three-Dimensional Structures Through Electron Beam Induced Deposition (EBID) of Carbon in Combination with Metal-Assisted Chemical Etching (MaCE) of Silicon

Cited by 75 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Design and manufacturing of micro/nanorobots;International Journal of Extreme Manufacturing;2024-09-04

2. Demystifying metal-assisted chemical etching of GaN and related heterojunctions;Applied Physics Reviews;2024-04-30

3. Plasma‐Damage Free Efficiency Scaling of Micro‐LEDs by Metal‐Assisted Chemical Etching;Advanced Optical Materials;2024-04-03

4. Bimetallic-catalyst metal-assisted chemical etching for tailored formation of high-aspect-ratio III−V compound semiconductor submicron pillar arrays;Physics and Simulation of Optoelectronic Devices XXXII;2024-03-11

5. Metal-assisted chemical etching beyond Si: applications to III–V compounds and wide-bandgap semiconductors;Nanoscale;2024