Maskless and Resist-Free Rapid Prototyping of Three-Dimensional Structures Through Electron Beam Induced Deposition (EBID) of Carbon in Combination with Metal-Assisted Chemical Etching (MaCE) of Silicon-Reference-Cited by-同舟云学术

Maskless and Resist-Free Rapid Prototyping of Three-Dimensional Structures Through Electron Beam Induced Deposition (EBID) of Carbon in Combination with Metal-Assisted Chemical Etching (MaCE) of Silicon

Published:2010-03-31 Issue:4 Volume:2 Page:969-973
ISSN:1944-8244
Container-title:ACS Applied Materials & Interfaces
language:en
Short-container-title:ACS Appl. Mater. Interfaces

Author:

Rykaczewski Konrad¹,Hildreth Owen J.¹,Kulkarni Dhaval¹,Henry Matthew R.¹,Kim Song-Kil¹,Wong Ching Ping¹,Tsukruk Vladimir V.¹,Fedorov Andrei G.¹

Affiliation:

1. G. W. Woodruff School of Mechanical Engineering and School of Materials Science and Engineering, Georgia Institute of Technology, Atlanta, GA 30332

Publisher

American Chemical Society (ACS)

Subject

General Materials Science

Link

https://pubs.acs.org/doi/pdf/10.1021/am1000773

Reference46 articles.

1. Black nonreflecting silicon surfaces for solar cells

2. Tunable photonic bandgap structures for optical interconnects

3. Luminescence of Silicon Materials: Chains, Sheets, Nanocrystals, Nanowires, Microcrystals, and Porous Silicon

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