In Situ Reaction Mechanism Studies on the New tBuN=M(NEt2)3 -Water and tBuN=M(NEt2)3 - Ozone (M = Nb,Ta) Atomic Layer Deposition Processes
Author:
Affiliation:
1. Laboratory of Inorganic Chemistry, University of Helsinki, P.O. Box 55, FIN-00014 Helsinki, Finland
Publisher
American Chemical Society (ACS)
Subject
Materials Chemistry,General Chemical Engineering,General Chemistry
Link
https://pubs.acs.org/doi/pdf/10.1021/cm202933g
Reference43 articles.
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2. Atomic Layer Deposition Chemistry: Recent Developments and Future Challenges
3. Atomic Layer Deposition of Oxide Thin Films with Metal Alkoxides as Oxygen Sources
4. In Situ Quadrupole Mass Spectrometry Study of Atomic-Layer Deposition of ZrO2 Using Cp2Zr(CH3)2 and Water
5. In Situ Quartz Crystal Microbalance and Quadrupole Mass Spectrometry Studies of Atomic Layer Deposition of Aluminum Oxide from Trimethylaluminum and Water
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