Effect of the Bilayer Period of Atomic Layer Deposition on the Growth Behavior and Electrical Properties of the Amorphous In–Zn–O Film-Reference-Cited by-同舟云学术

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Effect of the Bilayer Period of Atomic Layer Deposition on the Growth Behavior and Electrical Properties of the Amorphous In–Zn–O Film

Published:2020-08-04 Issue:35 Volume:12 Page:39372-39380
ISSN:1944-8244
Container-title:ACS Applied Materials & Interfaces
language:en
Short-container-title:ACS Appl. Mater. Interfaces

Author:

Lee Sangbong¹,Kang Yun-Ho¹,Kim Min-Sik¹,Lee Hyerin²,Cho Yeong-Ho¹,Kim Minsu¹^ORCID,Yoon Tae-Sik²^ORCID,Kim Hyun-Mi³^ORCID,Kim Ki-Bum¹³^ORCID

Affiliation:

1. Department of Materials Science and Engineering, Seoul National University, Seoul 08826, Republic of Korea

2. Department of Materials Science and Engineering, Myongji University, Yongin, Gyeonggi-do 17058, Republic of Korea

3. Research Institute of Advanced Materials (RIAM), Seoul National University, Seoul 08826, Republic of Korea

Funder

Samsung

National Research Foundation of Korea

Ministry of Science, ICT and Future Planning

Publisher

American Chemical Society (ACS)

Subject

General Materials Science

Link

https://pubs.acs.org/doi/pdf/10.1021/acsami.0c07540

Reference45 articles.

1. Past achievements and future challenges in the development of optically transparent electrodes

2. Semiconducting transparent thin films: their properties and applications

3. Transparent electrodes for organic optoelectronic devices: a review

4. Electrical properties of vacuum-deposited indium oxide and indium tin oxide films

5. Transparent amorphous indium zinc oxide thin-film transistors fabricated at room temperature

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1. Facile routes to enhance doping efficiency using nanocomposite structures for high-mobility and stable PEALD-ITGO TFTs;Applied Surface Science;2024-08

2. Realization of high transparent mobility zinc‐doped indium oxide (IZO) thin films by RF‐magnetron sputtering;International Journal of Applied Ceramic Technology;2024-06-20

3. Crystallization Disruption via Atomic Layer Deposition Substitutional Dopant Scheduling: High-Mobility Amorphous Indium Zinc Tin Oxide;ACS Applied Optical Materials;2024-05-03

4. Realization of an autonomously controllable process for atomic layer deposition and its encapsulation application in flexible organic light-emitting diodes;Optics Express;2023-06-13

5. Transparent Conductive Indium Zinc Oxide Films: Temperature and Oxygen Dependences of the Electrical and Optical Properties;Coatings;2022-10-19

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