Velocity Distributions of SiF and SiF2 in an SiF4 Plasma Molecular Beam
Author:
Affiliation:
1. Department of Chemistry, Colorado State University, Fort Collins, Colorado 80523-1872
Publisher
American Chemical Society (ACS)
Subject
Physical and Theoretical Chemistry
Link
https://pubs.acs.org/doi/pdf/10.1021/jp0212040
Reference32 articles.
1. Plasma Etching of Si, SiO2, Si3 N 4, and Resist with Fluorine, Chlorine, and Bromine Compounds
2. The analyses of an SiF4 plasma in an R.F. glow discharge for preparing fluorinated amorphous silicon thin films
3. rf glow discharge of SiF4‐H2mixtures: Diagnostics and modeling of thea‐Si plasma deposition process
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