Large-Area Roll-to-Roll and Roll-to-Plate Nanoimprint Lithography: A Step toward High-Throughput Application of Continuous Nanoimprinting
Author:
Affiliation:
1. Department of Mechanical Engineering
2. Department of Electrical Engineering and Computer Science, University of Michigan, Ann Arbor, Michigan 48109
Publisher
American Chemical Society (ACS)
Subject
General Physics and Astronomy,General Engineering,General Materials Science
Link
https://pubs.acs.org/doi/pdf/10.1021/nn9003633
Reference34 articles.
1. Imprint of sub‐25 nm vias and trenches in polymers
2. Imprint Lithography with 25-Nanometer Resolution
3. Nanoimprint Lithography: Methods and Material Requirements
4. Fabrication of 60-nm transistors on 4-in. wafer using nanoimprint at all lithography levels
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